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Program Committee

2007 International Conference on

Nanofabrication Technologies, Devices and Applications

NanoFab 2007

May 20 - 24, 2007
Santa Clara Convention Center
Silicon Valley, U.S.A

An Interdisciplinary Integrative Forum on
manufacturability in nanofabrication processes and technologies
for current and novel devices and applications.

Symposium Sponsor

Conference Chairs

Warren Y.C. Lai, Alcatel-Lucent
Leonidas E. Ocola, Argonne National Laboratory
Stanley Pau, University of Arizona

Keynote Speakers

	Opportunities in Nanotechnology Measurement Darlene J.S. Solomon Agilent Technologies, USA
	Nanotechnology and Applications in III-V Materials and Devices Ilesanmi Adesida University of Illinois at Urbana-Champaign, USA

	MEMS Replaces the Quartz Crystal Kurt Petersen SiTime Corporation, USA
	CMOS Process and Design Options for 32nm and beyond Andreas Wild Freescale Semiconductors Crolles Research Center, France

Symposium Sessions
	Monday May 21
7:00	Registration
8:30	Nanotech Conference Opening & Keynotes
1:30	NanoFab: Nano Photonics Devices & Fabrication
4:20	NanoFab: Nanofabrication Equipment, Imaging & Characterization
4:00	NanoFab: Nano-Wires: Fabrication and Applications
	Tuesday May 22
7:00	TUESDAY - Registration
11:00	NanoFab: Bottom-Up Approach: Nano-Composites and Nano-Particles
1:30	NanoFab: Non-Conventional Nano-Patterning: Top Down/Bottom Up Convergence
3:30	NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML
3:50	NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML
6:00	IEEE-SA Nanotechnology Town HallMeeting
4:00	Poster Session 1 (4:00 - 6:00) & Expo Reception
	Wednesday May 23
8:30	Keynotes: NanoFab: NanoElectronics
11:00	NanoFab: Advances in Nano-Lithography
1:00	Nanoscale Tools
1:00	NanoFab: Novel Materials and Nano-Structures Fabrication
2:00	Nanotech Poster Session 2 - Expo Reception (2:00 - 4:00)
4:00	NanoFab: Nano Electronics: Molecular and Nano Electronics
	Thursday May 24
8:30	NanoFab Keynotes
10:30	NanoFab: Nanoscale Deposition and Patterning
10:30	NanoFab: Nano-Structure, Material and Applications
1:30	NanoFab: Nano-Devices Properties, Modeling and Fabrication
1:30	NanoFab: Nano-Material Surfaces and Thin Film Science & Technology
4:00	NanoFab: Bottom-Up Approach: Bio-Nano Device Fabrication

Symposium Program
	Monday May 21
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7:00	Registration	Main Lobby
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8:30	Nanotech Conference Opening & Keynotes	Grand Ballroom
	Session chair: Bart Romanowicz, NSTI, Andreas Wild, Freescale Semiconductors
8:30	How the US Can Ensure Energy Supply for the Future J. Hofmeister, Shell Oil, US (bio)
9:10	National Nanotech Initiative and Industrial Nanotechnology Impact A.H. Carim, Co-Chair, Nanoscale Science and Engineering Technology, Subcommittee, National Science & Technology Council, U.S. Department of Energy, US (bio)
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1:30	NanoFab: Nano Photonics Devices & Fabrication	Great America 2
	Session chair: Uma Krishnamoorthy, Sandia National Labs, US
1:30	Fabrication Process of 3D-photonic crystals via UV-Nanoimprint Lithography T. Glinsner, P. Lindner, M. Mühlberger, I. Bergmair, R. Schöftner and K. Hingerl, EV Group, AT
1:50	Engineering the Spectral Response of Waveguide Bragg Gratings Patterned by Deep Ultraviolet Nanolithography C.M. Greiner, D. Iazikov, T.W. Mossberg, A. Ticknor and B. McGinnis, LightSmyth Technologies, US
2:10	Metal-Semiconductor-Metal Ultraviolet Detectors Utilizing Ge Nanocrystals Active Medium on Si Substrate S.Y. Lo, P.J. Wu, R.H Yeh and J.W. Hong, National Central University, TW
2:30	Integrating 1D Nanostructures in Devices and Circuits for Massively Parallel and Manufacturable Nanoscale Electronics and Photonics M. Saif Islam, A. Choudhry and E. Fong, University of California- Davis, US
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4:20	NanoFab: Nanofabrication Equipment, Imaging & Characterization	Great America 2
	Session chair: Andres H. La Rosa, Portland State University and Stanley Pau, University of Arizona
4:20	Correlated roughness in polymer film containing magnetic nanoparticles M.M. Abul Kashem, J. Perlich, L. Schulz, S.V. Roth and P. Müller-Buschbaum, Technische Universität München, DE
4:40	An All-Digital Cantilever Controller for MRFM and Scanned Probe Microscopy using a Combined DSP/FPGA Design D. de Roover, L.M. Porter II, A. Emami-Naeini, J.A. Marohn, S. Kuehn, S. Garner and D.D. Smith, SC Solutions, Inc., US
5:00	Highly sensitive Scanning Capacitance Microscope H. Tanbakuchi, Agilent Technologies, US
5:20	Confocal Raman AFM, a powerful tool for the nondestructive characterization of heterogeneous materials U. Schmidt, F. Vargas, M. Kress, T. Dieing, K. Weishaupt and O. Hollricher, WITec GmbH, DE
5:40	Nano Equipment and Materials for Electronics - Market Needs and Outlook L. Sheet, SEMI, US
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4:00	NanoFab: Nano-Wires: Fabrication and Applications	Grand Ballroom F
	Session chair: Takamaro Kikkawa, Hiroshima University (Japan) and National Institute of Advanced Industrial Science and Technology (Japan)
4:00	Horizontal and Vertical Heterogeneous Integration of Nanowires on Si Substrates L. Tsakalakos, S.T. Taylor, R.R. Corderman, J. Fronheiser and J. Balch, General Electric - Global Research Center, US
4:20	One-dimensional Phase-Change Nanowires for Information Storage Application X.H. Sun and B. Yu, NASA Ames Research Center, US
4:40	Transition Metal Oxide Core-Shell Nanowires: Synthesis and Electronic Properties C. Zhou, University of Southern California, US
5:00	InSb and GaInSb nanowires for thermoelectric applications Q.L. Ye, R. Scheffler, J. Kumari and R. Leverenz, NASA Ames Research Center, US
5:20	A unique opportunity for industrial scale fabrication of semiconductor nanowire-based devices B. Nikoobkht, National Institute of Standards and Technology, US
	Tuesday May 22
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7:00	TUESDAY - Registration	Main Lobby
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11:00	NanoFab: Bottom-Up Approach: Nano-Composites and Nano-Particles	Grand Ballroom E
	Session chair: Takamaro Kikkawa, Hiroshima University (Japan) and National Institute of Advanced Industrial Science and Technology (Japan)
11:00	Synthesizing agglomerate-free nanocomposites with surface-functionalized nanoparticles in a PMMA matrix. H. Dietsch and P. Schurtenberger, University of Fribourg, CH
11:20	Fracture of Vacancy-defected Carbon Nanotubes and Their Embedded Composites S.P. Xiao and W.Y. Hou, The University of Iowa, US
11:40	Noncovalent Catenation between Metal-Ligand Coordination Macrocycles and _-Cyclodextrin Y. Liu, Lawrence Berkeley National Laboratory, US
12:00	Ultra-thin Nanocomposite Membranes for Highly Sensitive Sensors T.J. Kang, E.Y. Jang, J.H. Lee and Y.H. Kim, Seoul National University, KR
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1:30	NanoFab: Non-Conventional Nano-Patterning: Top Down/Bottom Up Convergence	Grand Ballroom E
	Session chair: Guy DeRose, California Institute of Technology, US
1:30	Gas Phase Nanoparticle Integration C.R. Barry and H.O. Jacobs, University of Minnesota, US
1:50	Template directed formation of nanostructures of biomolecules and inorganic nano-materials on silicon surface M. Liu and S.J. Rosner, Agilent Technologies, US
2:10	A Nanoengineering Approach to Regulate the Lateral Heterogeneity of Binary Self-Assembled Monolayers J.J. Yu, X.Q. Tong and A. Ueki, Agilent Technologies, Inc., US
2:30	Silicon Nanowire Transistors Fabricated by the Mass-Manufacturable, Self-Assembling “Grow-in-Place” Approach Y. Shan and S.J. Fonash, Pennsylvania State University, US
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3:30	NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML	Grand Ballroom E
	Session chair: Norbert Kappel, ASML
3:30	ASML Strategic Alliances for NanoTechnology R. van der Werf, ASML, NL
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3:50	NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML	Grand Ballroom E
	Session chair: Norbert Kappel, ASML
-	B. Segal, Nantero, US
-	B. Bruggeman, SVTC, US
-	M. Tang, Stanford Nanofabrication Facility, US
-	J. Brown, SiTime, US
-	J. Consolini, ASML, US
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6:00	IEEE-SA Nanotechnology Town HallMeeting	Grand Ballroom E
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4:00	Poster Session 1 (4:00 - 6:00) & Expo Reception	Exhibit Hall
	Wednesday May 23
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8:30	Keynotes: NanoFab: NanoElectronics	Grand Ballroom C
	Session chair: Uma Krishnamoorthy, Sandia National Labs and Leo Ocola, Argonne National Laboratory, US
8:30	CMOS Process and Design Options for 32nm and beyond A. Wild, Freescale Semiconductors Crolles Research Center, FR (bio)
9:15	Nanotechnology and Applications in III-V Materials and Devices I. Adesida, University of Illinois at Urbana-Champaign, US (bio)
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11:00	NanoFab: Advances in Nano-Lithography	Grand Ballroom C
	Session chair: Sang Hyun Oh, University of Minnesota, US
11:00	Novel lithography technique using an ASML stepper/scanner for the manufacture of display devices in MEMS world K. Best, P. Raval, N. Kappel, C. Yang, M. Wang, N. Jeewakhan, M. Prejda, K. Kassekert and M. Moore, ASML USA, Inc - Special Applications, US
11:20	High resolution Nanolithography using Focused Ion Beam Scanning Electron Microscopy (FIB SEM) O. Wilhelmi, L Roussel, D.J. Stokes and D.H.W. Hubert, FEI Company, NL
11:40	Dip Pen Nanolithography®: A Maturing Technology for High-Throughput Flexible Nanopatterning J.R. Haaheim, E.R. Tevaarwerk, J. Fragala and R. Shile, NanoInk, Inc., US
12:00	Fabrication of Bowtie Nano-Gap Structures by Electron Beam Lithography R. Murali, E. Walters, F. Zaman, C. Tabor, W. Huang, M. El-Sayed and J.D. Meindl, Georgia Tech, US
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1:00	Nanoscale Tools	Grand Ballroom G
	Session chair: John Tucker, Keithley Instruments
1:00	Avoiding self-heating effects and measurement errors on nanoscale devices using Pulse I-V techniques J. Tucker, KeithleyInstruments, Inc., US
1:20	Computer aided design of nano-scale technologies K. Stokbro, Atomistix, US
1:40	Electronic and magnetic transport measurements with probe stations J. Lindemuth, Lake Shore Cryotronics, US
2:00	Nanopositioners – An essential part of the nanotechnology toolkit J.F. MacKay, Mad City Labs, US
2:20	Attributes of DPN® – compelling nanotechnology; Unique Advantages of NSCRIPTOR™ J. Haahein, Nanoink, US
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1:00	NanoFab: Novel Materials and Nano-Structures Fabrication	Grand Ballroom C
	Session chair: Guy DeRose, California Institute of Technology, US
1:00	Responsive Hydrogels as Model Materials to Study the Deformation Behavior of Patterned Polymer Nanostructures V.R. Tirumala, C.M. Stafford, R. Huang, E.K. Lin and L.E. Ocola, National Institute of Standards and Technology, US
1:20	Title: Nano/micro-structures formation driven by local protonation of polymer thin films via dip-pen nanolithography C. Maedler, S. Chada, A. La Rosa and M. Yan, Portland State University, US
1:40	Bio-inorganic hybrids for nanoelectronics M. Ozkan, University of California - Riverside, US
2:00	Single Crystalline InN Nanorods: Controlled Synthesis, Characterizations, and Applications O. Kryliouk, H.J. Park, J. Mangum, T. Anderson, A. Davydov, I. Levin and Z. Liliental-Weber, University of Florida, US
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2:00	Nanotech Poster Session 2 - Expo Reception (2:00 - 4:00)	Exhibit Hall
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4:00	NanoFab: Nano Electronics: Molecular and Nano Electronics	Grand Ballroom B
	Session chair: Mangat Pawitter, Motorola, US
4:00	Nano-future: More Moore or More than Moore? A. Ionescu, EPFL, CH
4:30	Hybrid Semiconductor/Nanoelectronic Circuit Architectures K.K. Likharev, Stony Brook University, US
4:50	Three-terminal, single molecule circuits based on carbon nanotube interconnects B.R. Goldsmith, J.G. Coroneus, V.R. Khalap, A.A. Kane, G.A. Weiss and P.G. Collins, University of California, Irvine, US
5:10	A Quasimolecular Approach to the Field-effect Molecular Transistor: Theory and Application Y.-L. Zhao, T. Allison, V. Mujica, C. Gonzalez and M. Marquez, NIST Center for Theoretical and Computational Nanosciences, US
5:30	High Quality Nanogap Electrodes for Electronic Transport Measurements of Single Molecules D.E. Johnston, D.R. Strachan, B.S. Guiton, P.K. Davies, D.A. Bonnell and A.T. Johnson, University of Pennsylvania, US
	Thursday May 24
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8:30	NanoFab Keynotes	Grand Ballroom H
	Session chair: Leo Ocola, Argonne National Laboratory
8:30	MEMS Replaces the Quartz Crystal K. Petersen, Sitime Corporation, US (bio)
9:15	Opportunities in Nanotechnology Measurement D. Solomon, Agilent, US (bio)
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10:30	NanoFab: Nanoscale Deposition and Patterning	Grand Ballroom H
	Session chair: Sang Hyun Oh, University of Minnesota and Stanley Pau, University of Arizona
10:30	Electric Field Process for the Fabrication of Higher Order Structures form Biomolecule Derivatized Nanoparticles M.J. Heller, D. Dehlinger, B. Sullivan and S. Esener, University of California, San Diego, US
10:50	Nanofabrication of Biomaterial, CNT and Organic Polymer Patterned Thinfilms using Piezoelectric Ink Jet Printing J.L. Sumerel, L.F. Deravi and D.W. Wright, Dimatix, Inc., US
11:10	Direct Parallel Patterning of Multiplex DNA and protein arrays S. Rozhok, N. Amro, J. Fragala, T. Levesque and M. Nelson, NanoInk, Inc., US
11:30	Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication B.C. Lee, M.H. Kim, H.J. Shin and S. Moon, Korea Institute of Science and Technology, KR
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10:30	NanoFab: Nano-Structure, Material and Applications	Grand Ballroom B
	Session chair: Greg Bogart, Sandia National Labs and Leo Ocola, Argonne National Laboratory
10:30	Electroluminescence from Surface Oxidized Silicon Nanoparticles Randomly Dispersed within a Polymer Matrix R.K. Ligman, L. Mangolini, U. Kortshagen and S.A. Campbell, University of Minnesota, US
10:50	Electroluminescence of ZnO Nanowire/p-GaN Heterojunction Light Emitting Diodes X. Wang, J.J. Cole and H.O. Jacobs, University of Minnesota, US
11:10	Monolayer to Multilayers Nanostructural Evolution in N type Oligothiphenes: Implications for OFET Performance G.R. Dholakia, A. Facchetti and T.J. Marks, ELORET / NASA Ames Research Center, US
11:30	Parylene Nanospheres, Nanotubes & Nanocoatings for Medical and Electronics Applications R. Kumar and A. Greiner, Specialty Coating Systems, US
11:50	Development of Nanostructures, Nanodevices, Nanocomposites, and Hierarchical Nanocomposites at Hawaii Nanotechnology Laboratory M. Ghasemi-Nejhad and A. Cao, University of Hawaii at Manoa, US
12:10	Influence of Stress and Temperature on the Microstructure Stability of Nanocrystalline Materials R.K. Rajgarhia, S-W. Koh, D. Spearot, A. Saxena, P. Selvam and R. Tummala, University of Arkansas, Fayetteville, US
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1:30	NanoFab: Nano-Devices Properties, Modeling and Fabrication	Grand Ballroom H
	Session chair: Mangat Pawitter, Motorola and Leo Ocola, Argonne National Laboratory
1:30	Grain Size Distribution in CoCrPtO-Based Perpendicular Magnetic Recording Media F. Hossein-Babaei, U. Kwon and R. Sinclair, Stanford University, US
1:50	400-900 nm Light Emitting Silicon Nanoparticles R.W. Liptak, X.D. Pi, U. Kortshagen and S.A. Campbell, University of Minnesota, US
2:10	Quantum Correction for the Current-Based One-Particle Monte-Carlo Method S.C. Brugger, A. Wirthmueller and A. Schenk, ETH Zürich, CH
2:30	Single Election Trapping in Nanoscale Transistors; RTS(Random Telegraph Signals) and l/f Noise L. Forbes, D.A. Miller and M.Y. Louie, Oregon State University, US
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1:30	NanoFab: Nano-Material Surfaces and Thin Film Science & Technology	Grand Ballroom B
	Session chair: Greg Bogart, Sandia National Labs and Leo Ocola, Argonne National Laboratory
1:30	Nanoscale hydrophobic coatings for the separation of liquid mixtures P. Truman, R. Frenzel, N. Longari, P. Uhlmann and M. Stamm, Institute of Polymer Research, DE
1:50	The Si-tag for Immobilizing Proteins on a Silicon Device A. Kuroda, Hiroshima University, JP
2:10	Low Temperature Nanolayers of Metal Oxides By MVD B. Kobrin, N. Dangaria and J. Chinn, Applied Microstructures, Inc, US
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4:00	NanoFab: Bottom-Up Approach: Bio-Nano Device Fabrication	Grand Ballroom H
	Session chair: Warren Lai, Alcatel-Lucent Bell Laboratories and New Jersey Nanotechnology Consortium, US
3:30	From Particle Self-Assembly to the Creation of Biologically Relevant Nanopatterns T.M. Blättler, A. Binkert, E. Reimhult, M. Textor and J. Vörös, ETH Zurich, CH
3:50	Manufacturable nanoscale membranes – material development and biological separations T.R. Gaborski, C.C. Striemer, J.L. Snyder, D.Z. Fang, P.M. Fauchet and J.L. McGrath, University of Rochester, US
4:10	Nano-Patterned Surfaces Enhance Immunoreaction Efficiency A. Valsesia, I. Mannelli, P. Colpo, F. Bretagnol, G. Ceccone and F. Rossi, European Commision Joint researcc Center, IT
4:30	Multifunctional Bio-Nano Patterns Derived from Colloidal Self-Assembly as Model Surfaces to Study Antigen-Antibody Interactions S. Krishnamoorthy, J.P. Wright, O. Worsfold, T. Fujii and M. Himmelhaus, Fujirebio, Inc., JP
4:50	Micro-photonic cylindrical waveguide based protein biosensor S.K. Padigi, K. Asante, V.S. Reddy Kovvuri, R.K. Reddy, A. La Rosa and S. Prasad, Portland State University, US

Announcement and Call for Participation

About NanoFab

The largest gathering in the field worldwide, NanoFab is the premier technical forum for presenting the latest research and development in nanofabrication technologies, devices and applications.

Objectives

Nanotechnology promises an unprecedented era of innovation across multiple disciplines and diverse applications. Its pursuits and activities are proliferating with different approaches, from top-down to bottom-up to converging techniques, and with varying degree of maturity from concept to commercialization. The key to realize nanotechnology's potential is still the ability to assemble and manufacture nano-scale devices, structures with dimensions smaller than 100nm. This conference will focus on all areas of nanofabrication that will accelerate nanotechnology's progress: innovative research to state-of-the-art development to cost-effective manufacturability in nanofabrication processes and technologies for current and novel devices and applications, including enabling and differentiating aspects in materials, metrology, characterization, and reliability.

Joint Meetings

The Nanotech 2007 Meeting, the NanoFab Conference, and the WCM workshop will be held at the Santa Clara Convention Center, Santa Clara, California, U.S.A., centrally located in the heart of the silicon valley.

The conference Technical Proceedings, consisting of articles submitted by authors of both oral and poster presentations will, be distributed to participants at registration.

In addition to the Technical Program, an exciting series of Social Events are being prepared to allow attendees ample opportunity to interact socially and enjoy the sights and sounds of Boston.

Topics and Application Areas

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Nanofabrication techniques involving growth, patterning and assembly can cover:

lithography by e-beam, laser milling, STM, ion beam, imprint, emboss, EUV, or process enhancement
etching pushing the nano-limits for novel material and structure with unconventional shape and profile or high-aspect ratio
material growth and deposition by MBE, MOCVD, ALD, layer-by-layer, spin-on, 3D nanostructure engineering, selective growth, or colloidal-assembly
non-conventional patterning approaches, including self-assembly, direct laser writing, interference lithography, two-photon absorption, and combination of top-down and bottom-up techniques
new materials, nano-particles, organic and biofunctional structures, novel processes, and challenges
electrochemical synthesis, dynamics at solid-liquid interfaces, and superhydrophobic surfaces
design, simulation, systems, and architectures that enhance nanofabrication
metrology and characterization, electrochemical and time resolved metrology, AFM, and nano-analysis for homo- and hetero-interfaces
standards, reliability, cost-effectiveness and industrial implementation of nanofabrication technologies.

Nano-devices can encompass optical, electrical, chemical, fluidic, acoustic, magnetic, piezoelectric, and other technologies. Emphasis will be on development of novel design and fabrication for nanotechnology applications:

optical, electrical and Terahertz sensor devices and network
laser: novel types, materials, and application
waveguide: fiber and integrated
MOEMS, MEMS, and NEMS for nano-applications
resonators and switches
nano-structure, carbon nanotube, nano-wire, nano-bridges, nano-dots
molecular and nano-electronics, organic and chalcogenide devices
genomics and proteomics, and nano-scaffold for bio-applications
micro- and nano-fluidic devices, liquid devices for electronics and photonics, catalytic activity, chemical reactor, lab-on-a-chip application, fuel cells, and crystal growth chamber
mechanical, acoustic, magnetic, and piezoelectric devices
devices based on plasmonics and surface enhanced phenomena in Raman scattering, nonlinear spectroscopy, infrared absorption, and photochemistry
hybrid, multifunctional, and other technologies.

All papers on nano-applications in photonic, microelectronic, telecommunication, chemical, biotech, medical, pharmaceutical, homeland security, environmental, agricultural, consumer, and transportation are relevant. The primary focus is on innovative fabrication that significantly advances current application and enables novel nano-application.

Nanofabrication papers that have significant overlap with other Nanotechnology Conferences at NSTI Nanotech may be presented in joint sessions to enhance the synergism of the Nanotechnology Conferences.

Journal Submissions

Journal of Experimental Nanoscience

Selected Nanotech Proceedings papers will be reviewed and invited into a Special Issue of the Journal of Experimental Nanoscience. The journal provides a showcase for advances in the experimental sciences underlying nanotechnology and nanomaterials.

For consideration into this Special Issue of the Journal of Experimental Nanoscience, please select the “Submit to Journal of Experimental Nanoscience” button during the on-line submission procedure. You may only select a single journal during the submission process.

Conference Organization

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Conference Chairs

Warren Y.C. Lai, Alcatel-Lucent
Leonidas E. Ocola, Argonne National Laboratory, USA
Stanley Pau, University of Arizona, USA

Program Committee

Adekunle Adeyeye, National University of Singapore, Singapore
Robert H. Austin, Princeton University, USA
Ronald S. Besser, Stevens Institute of Technology, USA
Gregory R. Bogart, Sandia National Laboratory, USA
Dustin W. Carr, Symphony Acoustics, USA
Chorng-Ping Chang, Applied Materials, Inc., USA
Charles Kin P. Cheung, Rutgers University, USA
Guy A. DeRose, California Institute of Technology, USA
Zhixiong Guo, Rutgers University, USA
Takamaro Kikkawa, Hiroshima University and National Institute of Advanced Industrial Science and Technology, Japan
Jungsang Kim, Duke University, USA
Uma Krishnamoorthy, Sandia National Laboratory, USA
Andres H. La Rosa, Portland State University, USA
Sergey D. Lopatin, Applied Materials, Inc., USA
Pawitter Mangat, Motorola, USA
Omkaram Nalamasu, Applied Materials, Inc., USA
Vivian Ng, National University of Singapore, Singapore
Sang Hyun Oh, University of Minnesota, USA
John A. Rogers, University of Illinois at Urbana-Champaign, USA
Nicolaas F. de Rooij, Univ. de Neuchatel, Switzerland
Gary Wiederrecht, Argonne National Laboratory, USA

Conference Operations Manager

Sarah Wenning, Nano Science and Technology Institute, USA

In Association with

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	2007 NSTI Nanotechnology Conference and Trade Show Nanotech 2007
	Eighth International Conference on Modeling and Simulation of Microsystems MSM 2007
	2007 International Conference on Computational Nanoscience and Nanotechnology ICCN 2007
	2007 Workshop on Compact Modeling WCM 2007
	2007 NSTI Bio Nano Conference and Trade Show BioNano 2007

Names, and logos of other organizations are the property of those organizations and not of NSTI.
This event is not open to the general public and NSTI reserves the right to refuse admission and participation to any individual.

2007 International Conference on

Nanofabrication Technologies, Devices and Applications

NanoFab 2007

May 20 - 24, 2007 Santa Clara Convention Center Silicon Valley, U.S.A

Symposium Sponsor

Conference Chairs

Keynote Speakers

Symposium Sessions

Monday May 21

Tuesday May 22

Wednesday May 23

Thursday May 24

Symposium Program

Monday May 21

Tuesday May 22

Wednesday May 23

Thursday May 24

Announcement and Call for Participation

About NanoFab

Objectives

Joint Meetings

Topics and Application Areas

Journal Submissions

Journal of Experimental Nanoscience

Conference Organization

Conference Chairs

Program Committee

Conference Operations Manager

In Association with

May 20 - 24, 2007
Santa Clara Convention Center
Silicon Valley, U.S.A